• Functional characteristics
  • Titanium sputtering targets are made from titanium metal and are used in a process called sputter coating. The titanium targetsare commonly used in hardware tool coating, decorative coating, semiconductor components, and flat display coating. the titaniumtarget boasts the same properties as titanium metal, such as high strength, lightweight and excellent corrosion resistance.It is aspecial electronic material with high added value. It has strong wear resistance and strong adhesion at home and abroad.Sputtering is one of the main techniques for preparing thin film materials. It uses ions generated by an ion source to accelerateand aggregate in a vacuum to form a high-speed energy ion beam, bombarding a solid surface, and kinetic energy exchange betweenions and solid surface atoms. The atoms on the solid surface are separated from the solid and deposited on the surface of thesubstrate. The bombarded solid is a raw material deposited by sputtering, called a sputtering target. MaterialTitanium (High Purity Titanium, Gr1, Gr2, Gr5, Gr7,GR12)Titanium Alloy target: Ti-Al/Ti-W/Ti-Si/Ti-Ni/Ti-Zr etcDimension1. Round target: Ø30--2000mm, thickness 3.0mm--300mm;2. Plate Targe: Length: 200-500mm Width:100-230mm Thickness:3--40mm3. Tube target: Dia:30-200mm Thickness:5-20mm Length:500-2000mm4. Customized is availableProduction ProcessTitanium sponge --- Smelted to titanium ingot ---Test---Cutting the ingot --- Forging ---Rolling ---Peeling---Straightening---Ultrasonic flaw detection --- PackingApplicationSemiconductor separation, Film coating materials, Storage Electrode coating, Sputtering coating, Surface coating, Glass coatingindustry.TechniqueForging ,MachiningQuality Control①Technicians self-check in production;②Engineer spot check in production;③QC inspect after products finished;④International sales who were trained the technical know-how spot check before shipping to ensure the quality.

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