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Home / Products / Titanium Metal Material / Titanium Target / TiAl Titanium Aluminum Alloy Sputtering Targets

TiAl Titanium Aluminum Alloy Sputtering Targets

  • Product name: Titanium Aluminum Alloy Sputtering Targets
  • Model Number: Titanium Alloy Target
  • Application: Chemical Industry or PVD coating
  • Semiconductor/glass/ Decroration Coating and so on
  • Shape: Target Materials
  • Material: Ti-Al,Ti-W,Ti-Si,Ti-Ni,Ti-Zr,Ti-Cu, Ti-Cr, etc
  • Chemical Composition: Ti-Al,Ti-W,Ti-Si,Ti-Ni,Ti-Zr,Ti-Cu, Ti-Cr, etc
  • Size:100mm*40mm or customized
  • Surface: Polished
  • Package: wooden box
  • Usage: Semiconductor ,Glass film and so on
  • Composition: Ti-Al/Ti-W/Ti-Si/Ti-Ni/Ti-Zr
  • Purity: 4N-5N-6N
Availability:
  • TiR


Titanium Aluminum Target

We accept Customized Ratios, Purity and Shape.
Ratios: TiAl5 at%, TiAl10 at%, TiAl20 at%, TiAl25 at%, TiAl 30 at%, TiAl40 at%, TiAl50 at%...
Purity: 99.5%、99.7%、99.8%、99.9%、99.95%、99.99%.

Shape: Circular, Plane, Tube, Arc, Multi-tile...


Impurity Content


Ratios
Ti-75Al at%
Ti-70Al at%
Ti-67Al  at%
Ti-60Al  at%
Ti-50Al
at%
Ti-30Al
at%
Ti-20Al
at%
Ti-14Al
at%
Purity (%)
99.7
99.7
99.7
99.7
99.8/99.9
99.9
99.9
99.9
Density
(g/cm3)
3.1
3.2
3.3
3.4
3.63/3.85
3.97
4.25
4.3
Grain Size (µm)
100
100
100
100
100/-
-
-
-
Production
HIP
HIP
HIP
HIP
HIP/VAR
VAR
VAR
VAR


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 Email: info@tirongmetal.com
                 jenny@junde-tech.com
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